Apertured ring for exhausting plasma reactor gases
US4820371A · kind A · utility
49Cited by
4References
18Claims
0Family size
Assignee
Inventor
Key dates
| Filing date | Dec 15, 1987 |
| Grant date | Apr 11, 1989 |
| Priority date | — |
| Expiry date | Dec 15, 2007 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J37/3244
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
An annular ring (38) adapted for use in a plasma reaction chamber. The annular ring (38) includes a central opening aperture for laterally retaining a semiconductor slice (40) within the chamber. Spaced around the ring are a plurality of gas exhaust ports (58) for providing a back pressure within the chamber, for removing gases therefrom. Different rings can be provided with different central opening apertures to accommodate the processing of different sized slices. Alternative arrangements of the ring (38) provide for mask openings (68) to mask selected areas of the slice (40) and prevent plasma reactions thereat.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.