Patent · US Expired

Method for cleanup processing chamber and vacuum process module

US4820377A · kind A · utility

297Cited by
24References
52Claims
0Family size

Assignee

Inventors

Key dates

Filing dateJul 16, 1987
Grant dateApr 11, 1989
Priority date
Expiry dateJul 16, 2007

Classification

  • Technology area (CPC Y)Emerging Cross-Sectional Technologies
  • CPC primaryY10S438/905
  • WIPO fieldSurface technology, coating
  • WIPO sectorChemistry

Abstract

A process module having remote plasma and in situ plasma generators, and a radiant heater, which represent three separate energy sources. The three sources can be used singly or in any combination and can be separately controllable.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.