Lithography apparatus
US4820928A · kind A · utility
Assignee
Inventors
Key dates
| Filing date | Oct 9, 1987 |
| Grant date | Apr 11, 1989 |
| Priority date | — |
| Expiry date | Oct 9, 2007 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J2237/31762
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
A lithography apparatus in which a charged particle ray such as an electron beam or an ion beam is controlled to scan a desired region of a sample and thereby draw a pattern, including a framing pattern memory for storing therein closed framing lines of a pattern to be drawn in the form of dot images, a framing pattern generator for writing the framing lines of the pattern to be drawn into said framing pattern memory in the form of dot images, and a raster scanning circuit for scanning the framing pattern memory having stored therein closed framing lines of the pattern to be drawn and for generating a beam deflection address for drawing the pattern and a beam blanking control signal.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.