Polysulfone barrier layer for bi-level photoresists
US4835086A · kind A · utility
10Cited by
13References
21Claims
0Family size
Assignee
Inventor
Key dates
| Filing date | Feb 12, 1988 |
| Grant date | May 30, 1989 |
| Priority date | — |
| Expiry date | Feb 12, 2008 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/094
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A photosensitive article which comprises a substrate, a first light sensitive layer on the substrate, a polysulfone layer and a second light sensitive layer. The first light sensitive layer preferably comprises a depolymerizable polymethyl methacrylate polymer and the second light sensitive layer preferably comprises on o-quinone diazide in admixture with a water insoluble, aqueous alkaline soluble binder resin.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.