Ion-projection apparatus
US4835392A · kind A · utility
7Cited by
6References
14Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Nov 20, 1987 |
| Grant date | May 30, 1989 |
| Priority date | — |
| Expiry date | Nov 20, 2007 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J37/3007
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
An ion-projecting apparatus which has between the ion source and the mask, directly proximal to the mask, at least one ion optical correction element in the form of a multipole with at least eight poles and so located that there is no other deflection means between the octapole and the mask.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.