Gerhard Stengl
38Patents
12h-index
20Co-inventors
81Inventor score
Filing activity: Dec 16, 1980 → Jan 31, 2007
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US7388217B2 | Particle-optical projection system | Electricity | 1,444 | Active |
| US6768125B2 | Maskless particle-beam system for exposing a pattern on a substrate | Electricity | 89 | Expired |
| US4985634A | Ion beam lithography | Electricity | 69 | Expired |
| US4967088A | Method and apparatus for image alignment in ion lithography | Electricity | 58 | Expired |
| US7214951B2 | Charged-particle multi-beam exposure apparatus | Electricity | 35 | Expired |
| US4780382A | Process for making a transmission mask | Emerging Cross-Sectional Technologies | 24 | Expired |
| US6858118B2 | Apparatus for enhancing the lifetime of stencil masks | Electricity | 24 | Expired |
| US7772574B2 | Pattern lock system for particle-beam exposure apparatus | Electricity | 22 | Active |
| US7199373B2 | Particle-optic electrostatic lens | Electricity | 21 | Expired |
| US6989546B2 | Particle multibeam lithography | Electricity | 20 | Expired |
| US7033647B2 | Method of synthesising carbon nano tubes | Emerging Cross-Sectional Technologies | 16 | Expired |
| US4894549A | Apparatus for demagnification or full-size ion projection lithography | Electricity | 13 | Expired |
| US5350924A | Ion-optical imaging system | Electricity | 12 | Expired |
| US4859857A | Ion-projection apparatus and method of operating same | Electricity | 12 | Expired |
| US5742062A | Arrangement for masked beam lithography by means of electrically charged particles | Electricity | 11 | Expired |
| US4924104A | Ion beam apparatus and method of modifying substrate | Electricity | 10 | Expired |
| US7737422B2 | Charged-particle exposure apparatus | Electricity | 10 | Active |
| US4823011A | Ion-projection lithographic apparatus with means for aligning the mask image with the substrate | Electricity | 10 | Expired |
| US6326632A | Particle-optical imaging system for lithography purposes | Electricity | 10 | Expired |
| US6909103B2 | Ion irradiation of a target at very high and very low kinetic ion energies | Electricity | 8 | Expired |
| US5801388A | Particle beam, in particular ionic optic imaging system | Electricity | 8 | Expired |
| US5378917A | Particle-beam imaging system | Electricity | 8 | Expired |
| US4835392A | Ion-projection apparatus | Electricity | 7 | Expired |
| US8368015B2 | Particle-optical system | Electricity | 7 | Active |
| US4775797A | Method of stabilizing a mask | Physics | 6 | Expired |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.