Heating system for reaction chamber of chemical vapor deposition equipment
US4836138A · kind A · utility
Assignee
Inventors
Key dates
| Filing date | Jun 18, 1987 |
| Grant date | Jun 6, 1989 |
| Priority date | — |
| Expiry date | Jun 18, 2007 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC23C16/481
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
A heating system for use in chemical vapor deposition equipment of the type wherein a reactant gas is directed in a horizontal flow for depositing materials on a substrate which is supported in a reaction chamber on a susceptor which is rotatably driven for rotating the substrate about an axis which extends normally from its center. The heating system works in conjunction with a special heat sensing arrangement and includes an upper heating element assembly, a lower heating element assembly and a heat concentrator mechanism which interact to provide rapid temperature build-up at the beginning of a processing cycle, rapid temperature attenuation at the end of a processing cycle and a controlled flat temperature profile during the processig cycle.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.