Magnetron cathode and method for sputter coating
US4842703A · kind A · utility
56Cited by
18References
12Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Feb 23, 1988 |
| Grant date | Jun 27, 1989 |
| Priority date | — |
| Expiry date | Feb 23, 2008 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC23C14/3407
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
A magnetron sputter coating assembly. The assembly includes a concave consumable target spaced closely to a substrate coating position. Coating uniformity is maintained by controlling ion formation between the substrate and the target. This is accomplished with a plurality of ferromagnetic pole pieces and two individually energizable current carrying coils. The consumable target may be constructed in two segments. A first inner segment defines a generally planar target base parallel to the substrate surface to be coated. A second, outer target segment has a coating surface that forms an angle with respect to the substrate surface.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.