Walter H. Class
8Patents
7h-index
10Co-inventors
60Inventor score
Filing activity: Nov 6, 1978 → Nov 29, 2007
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US4422896A | Magnetically enhanced plasma process and apparatus | Electricity | 81 | Expired |
| US4198283A | Magnetron sputtering target and cathode assembly | Electricity | 69 | Expired |
| US4842703A | Magnetron cathode and method for sputter coating | Chemistry; Metallurgy | 56 | Expired |
| US4581118A | Shaped field magnetron electrode | Chemistry; Metallurgy | 53 | Expired |
| US4472259A | Focusing magnetron sputtering apparatus | Electricity | 29 | Expired |
| US4525262A | Magnetron reactive bias sputtering method and apparatus | Electricity | 28 | Expired |
| US4428816A | Focusing magnetron sputtering apparatus | Electricity | 16 | Expired |
| US7728293B2 | Structures and methods for measuring beam angle in an ion implanter | Electricity | 0 | Active |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.