Positive photosensitive o-quinone diazide composition with benzotriazole carboxylic acid or alkyl ester
US4847178A · kind A · utility
10Cited by
5References
8Claims
0Family size
Assignee
Inventor
Key dates
| Filing date | Apr 30, 1987 |
| Grant date | Jul 11, 1989 |
| Priority date | — |
| Expiry date | Apr 30, 2007 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH05K3/0076
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A positive type photosensitive composition capable of improving the drawback in the conventional positive type photosensitive resin composition, improving adhesion between the positive type photoresist and the substrate and improving developability is provided by incorporating benzotriazole carboxylic acids in the positive type photoresist.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.