Hiroshi Komano
42Patents
13h-index
36Co-inventors
77Inventor score
Filing activity: Apr 30, 1987 → Oct 26, 2005
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US5714625A | Cyanooxime sulfonate compound | Chemistry; Metallurgy | 73 | Expired |
| US6063953A | Chemical-sensitization photoresist composition | Emerging Cross-Sectional Technologies | 42 | Expired |
| US5545281A | Method of bonding circuit boards | Emerging Cross-Sectional Technologies | 35 | Expired |
| US5318651A | Method of bonding circuit boards | Emerging Cross-Sectional Technologies | 29 | Expired |
| US6261745A | Post-ashing treating liquid compositions and a process for treatment therewith | Electricity | 29 | Expired |
| US5368991A | Photosensitive resin composition for use as a light-shielding film which can be used as black matrices | Physics | 24 | Expired |
| US6010824A | Photosensitive resin composition containing a triazine compound and a pre-sensitized plate using the same, and photosensitive resin composition containing acridine and triazine compounds and a color filter and a pre-sensitized plate using the same | Emerging Cross-Sectional Technologies | 24 | Expired |
| US6376153B2 | Photopolymerizable composition for color filter | Physics | 24 | Expired |
| US6268108A | Composition for forming antireflective coating film and method for forming resist pattern using same | Physics | 23 | Expired |
| US5714286A | Photosensitive resin composition for forming light shielding films, black matrix formed by the same, and method for the production thereof | Electricity | 19 | Expired |
| US6388101B1 | Chemical-sensitization photoresist composition | Emerging Cross-Sectional Technologies | 19 | Expired |
| US6087063A | Positive-working photoresist composition | Emerging Cross-Sectional Technologies | 17 | Expired |
| US5929271A | Compounds for use in a positive-working resist composition | Emerging Cross-Sectional Technologies | 14 | Expired |
| US5902713A | Chemical-sensitization photoresist composition | Emerging Cross-Sectional Technologies | 12 | Expired |
| US5800964A | Photoresist composition | Emerging Cross-Sectional Technologies | 12 | Expired |
| US5498498A | Photosensitive resin composition used in a method for forming a light-shielding film | Physics | 11 | Expired |
| US6838229B2 | Chemically amplified negative photoresist composition for the formation of thick films, photoresist base material and method of forming bumps using the same | Emerging Cross-Sectional Technologies | 10 | Expired |
| US4847178A | Positive photosensitive o-quinone diazide composition with benzotriazole carboxylic acid or alkyl ester | Electricity | 10 | Expired |
| US5578420A | Process for producing a flexographic printing plate | Physics | 9 | Expired |
| US6022666A | Chemical-sensitization photoresist composition | Emerging Cross-Sectional Technologies | 9 | Expired |
| US5928837A | Negative-working chemical-sensitization photoresist composition comprising oxime sulfonate compounds | Emerging Cross-Sectional Technologies | 8 | Expired |
| US5885746A | Photosensitive resin composition, photosensitive printing plate using the same and method of manufacturing printing master plate | Physics | 8 | Expired |
| US6641972B2 | Positive photoresist composition for the formation of thick films, photoresist film and method of forming bumps using the same | Physics | 7 | Expired |
| US7063934B2 | Negative photoresist compositions for the formation of thick films, photoresist films and methods of forming bumps using the same | Emerging Cross-Sectional Technologies | 7 | Expired |
| US5908720A | Photosensitive resin composition for forming light shielding films, black matrix formed by the same, and method for the production thereof | Physics | 7 | Expired |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.