Cross-flow diffusion furnace
US4854266A · kind A · utility
478Cited by
11References
7Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Nov 2, 1987 |
| Grant date | Aug 8, 1989 |
| Priority date | — |
| Expiry date | Nov 2, 2007 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC23C16/45591
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
A longitudinally extending cross-flow liner within a longitudinally extending cylindrical reaction vessel cooperates with at least one longitudinally extending gas injector within the cross-flow liner to provide transversely flowing gas across the surfaces of vertically oriented semiconductor wafers in such a way as to substantially eliminate both depletion phenomenon and downstream wafer pollution caused from particulates, unreacted reactant gas, and other contaminants and to provide uniformly coated wafers in a batch and repeatability batch to batch.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.