Ion-projection apparatus and method of operating same
US4859857A · kind A · utility
12Cited by
5References
23Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Jan 30, 1987 |
| Grant date | Aug 22, 1989 |
| Priority date | — |
| Expiry date | Jan 30, 2007 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J2237/31776
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
A multipole corrective element with the individual poles being electromagnetically energized individually and selectively to create a variable field around a charged particle beam projected through a mask and a lens system onto a substrate, e.g. an ion-beam or electron-beam microlithography. The corrective element is provided independently of the ion-optical lens system between the latter and the mask, preferably proximal to the mask.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.