Modification of polymeric surface for improved adhesion via electron beam exposure
US4861408A · kind A · utility
4Cited by
9References
18Claims
0Family size
Assignee
Inventor
Key dates
| Filing date | Apr 8, 1987 |
| Grant date | Aug 29, 1989 |
| Priority date | — |
| Expiry date | Apr 8, 2007 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC08J2327/12
- WIPO fieldOther special machines
- WIPO sectorMechanical engineering
Abstract
Treating polymer surfaces, e.g., Teflon, particularly very thin surfaces, e.g., 50-10,000 .ANG. with low energy electron radiation, e.g., 100-1000 eV, in a high vacuum environment, e.g., less than 10.sup.-6 Torr, to enhance the ability of the surface to be adhered to a variety of substrates.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.