Laser exposure apparatus
US4867542A · kind A · utility
Assignee
Inventors
Key dates
| Filing date | Aug 3, 1988 |
| Grant date | Sep 19, 1989 |
| Priority date | — |
| Expiry date | Aug 3, 2008 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH04N1/06
- WIPO fieldAudio-visual technology
- WIPO sectorElectrical engineering
Abstract
A laser exposure system for use in scanning and recording images, the system comprising subdividing the laser beam from the laser source into several parallel traces of laser beams; modulating the laser beams individually in response to the image signals be means of a multi-channel optical modulator; directing the modulated laser beams through a first mirror and a second mirror so as to enable the laser beams from the second mirror to be in parallel with the reference plane with respect to the sub-scanning direction; varying the distance between the modulator and the first mirror; and adjusting the angles of the first and second mirrors to the reference plane so that a possible decline of the laser beams in the sub-scanning direction is compensated.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.