Surface treatment of silicone-based coating films
US4868096A · kind A · utility
Assignee
Inventors
Key dates
| Filing date | Sep 3, 1987 |
| Grant date | Sep 19, 1989 |
| Priority date | — |
| Expiry date | Sep 3, 2007 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/11
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
The adhesiveness of a silicone-based coating film on a substrate to an overcoating layer, e.g., a photoresist layer, can be improved without causing cracks when the silicone-based coating film is subjected to a plasma treatment at a temperature of 120.degree. C. or below in an atmosphere of a gas mainly composed of oxygen. Similar conditions of plasma treatment are applicable when patterning of a silicone-based coating film is desired in a procedure comprising the steps of forming a photoresist layer thereon, patterning of the photoresist layer in a photolithographic method, selectively etching the silicone-based coating film with the patterned resist layer serving as a mask and removing the photoresist layer by the plasma treatment.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.