Split-phase driver for plasma etch system
US4871421A · kind A · utility
Assignee
Inventors
Key dates
| Filing date | Sep 15, 1988 |
| Grant date | Oct 3, 1989 |
| Priority date | — |
| Expiry date | Sep 15, 2008 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J2237/334
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
A plasma etching system includes a radio frequency generator and a parallel plate plasma reactor vessel. A phase inverter circuit is used to couple the RF generator to the electrodes in the plasma reactor so that the electrodes are driven with voltages of substantially equal magnitude but which are 180.degree. out-of-phase. In this way, a maximum potential difference between the electrodes can be achieved while minimizing the potential difference between the individual electrodes and the reactor vessel. Such operation allows higher power levels with reduced occurrence of arcing and stray discharge, and provides a stable, uniform plasma discharge.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.