Dark field target design system for alignment of semiconductor wafers
US4880309A · kind A · utility
14Cited by
5References
4Claims
0Family size
Assignee
Inventor
Key dates
| Filing date | Apr 14, 1987 |
| Grant date | Nov 14, 1989 |
| Priority date | — |
| Expiry date | Apr 14, 2007 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F9/7076
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A dark field target design system for alignment of semiconductor wafers is disclosed. The system utilizes improved target designs which provide for improvement in the alignment of semiconductor wafers.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.