Abrasive composition and process for polishing
US4883502A · kind A · utility
6Cited by
3References
12Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Oct 11, 1988 |
| Grant date | Nov 28, 1989 |
| Priority date | — |
| Expiry date | Oct 11, 2008 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC09K3/1463
- WIPO fieldBasic materials chemistry
- WIPO sectorChemistry
Abstract
An abrasive composition comprising: an aluminous abrasive, preferably having an average particle size of 0.5-10 .mu.m and a concentration of 1 to 25% by weight; nickel sulfamate, preferably having a concentration of 0.5 to 10% by weight; and water, the composition preferably having a pH of 4 to 7. This abrasive composition produces a superior effect when used for polishing an aluminum-based substrate for a magnetic recording disc.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.