Processing apparatus and method
US4886570A · kind A · utility
151Cited by
3References
40Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Dec 2, 1988 |
| Grant date | Dec 12, 1989 |
| Priority date | — |
| Expiry date | Dec 2, 2008 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC23C16/54
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
A process module having remote plasma and in situ plasma generators, a source of ultraviolet, and a radiant heater, which represent four separate energy sources. The four sources can be used singly or in any combination and can be separately controllable.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.