Patent · US Expired

Processes involving lithographic materials

US4892617A · kind A · utility

2Cited by
11References
6Claims
0Family size

Assignee

Inventors

Key dates

Filing dateOct 19, 1987
Grant dateJan 9, 1990
Priority date
Expiry dateOct 19, 2007

Classification

  • Technology area (CPC Y)Emerging Cross-Sectional Technologies
  • CPC primaryY10S438/98
  • WIPO fieldOptics
  • WIPO sectorInstruments

Abstract

Extremely useful compositions for delineation of materials utilized in device applications have been found. These compositions include a polymer having segments that are at least 10 monomer units long of a first entity and segments again at least 10 monomer units long of a second entity. The monomer units are chosen so that each segment type provides a specific chemical characteristic to the polymer.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.