Anthony E. Novembre
16Patents
8h-index
14Co-inventors
65Inventor score
Filing activity: Mar 6, 1986 → Jul 23, 2002
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US5948570A | Process for dry lithographic etching | Electricity | 78 | Expired |
| US5366851A | Device fabrication process | Physics | 56 | Expired |
| US5656182A | Process for fabricating a device in which the process is controlled by near-field imaging latent features introduced into energy sensitive resist materials | Physics | 23 | Expired |
| US5066566A | Resist materials | Emerging Cross-Sectional Technologies | 17 | Expired |
| US5688634A | Energy sensitive resist material and process for device fabrication using the resist material | Emerging Cross-Sectional Technologies | 13 | Expired |
| US4701342A | Negative resist with oxygen plasma resistance | Physics | 11 | Expired |
| US6051346A | Process for fabricating a lithographic mask | Physics | 10 | Expired |
| US6368753B1 | Mask repair | Physics | 9 | Expired |
| US4935094A | Negative resist with oxygen plasma resistance | Physics | 8 | Expired |
| US5985493A | Membrane mask for projection lithography | Physics | 3 | Expired |
| US5374504A | Resist materials and processes of their use | Emerging Cross-Sectional Technologies | 3 | Expired |
| US6838213B2 | Process for fabricating a mask | Physics | 2 | Expired |
| US4892617A | Processes involving lithographic materials | Emerging Cross-Sectional Technologies | 2 | Expired |
| US5451480A | Artical fabrication utilizing lithographic processes | Physics | 2 | Expired |
| US6372393B2 | Process for fabricating a projection electron lithography mask and a removable, reusable cover for use therein | Physics | 0 | Expired |
| US6251543A | Process for fabricating a projection electron lithography mask and a removable reusable cover for use therein | Physics | 0 | Expired |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.