Lithographic process having improved image quality
US4902899A · kind A · utility
118Cited by
7References
6Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Jun 1, 1987 |
| Grant date | Feb 20, 1990 |
| Priority date | — |
| Expiry date | Jun 1, 2007 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/70433
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A lithographic process having improved image quality by employing a mask that includes a plurality of opaque elements or transparent elements that are smaller than the resolution of the lighography to be employed in order to control the transmittance of the actinic light exposure area.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.