Alan E. Rosenbluth
106Patents
22h-index
90Co-inventors
93Inventor score
Filing activity: Oct 26, 1979 → Aug 20, 2020
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US6377233B2 | Micromechanical display and fabrication method | Emerging Cross-Sectional Technologies | 132 | Expired |
| US4902899A | Lithographic process having improved image quality | Physics | 118 | Expired |
| US6563566B2 | System and method for printing semiconductor patterns using an optimized illumination and reticle | Physics | 108 | Expired |
| US5517340A | High performance projection display with two light valves | Physics | 104 | Expired |
| US6323834A | Micromechanical displays and fabrication method | Emerging Cross-Sectional Technologies | 104 | Expired |
| US5680588A | Method and system for optimizing illumination in an optical photolithography projection imaging system | Physics | 102 | Expired |
| US5921650A | High efficiency field-sequential color projector using two SLMs | Physics | 87 | Expired |
| US5621486A | Efficient optical system for a high resolution projection display employing reflection light valves | Electricity | 64 | Expired |
| US5777789A | Efficient optical system for a high resolution projection display employing reflection light valves | Electricity | 51 | Expired |
| US7079223B2 | Fast model-based optical proximity correction | Physics | 49 | Expired |
| US6869739B1 | Integrated lithographic print and detection model for optical CD | Physics | 49 | Expired |
| US7512927B2 | Printability verification by progressive modeling accuracy | Physics | 48 | Active |
| US6082861A | Optical system and method for high contrast projection display | Electricity | 46 | Expired |
| US5452090A | CCD based confocal filtering for improved accuracy in x-ray proximity alignment | Physics | 45 | Expired |
| US7010776B2 | Extending the range of lithographic simulation integrals | Physics | 44 | Expired |
| US5159172A | Optical projection system | Physics | 44 | Expired |
| US6665033B2 | Method for forming alignment layer by ion beam surface modification | Physics | 34 | Expired |
| US6052231A | Beam dividing elements permitting projection of an image with high contrast | Physics | 32 | Expired |
| US5786934A | Efficient optical system for a high resolution projection display employing reflection light valves | Electricity | 28 | Expired |
| US4896952A | Thin film beamsplitter optical element for use in an image-forming lens system | Physics | 28 | Expired |
| US7057709B2 | Printing a mask with maximum possible process window through adjustment of the source distribution | Physics | 28 | Expired |
| US6636276B1 | Projection display system with at least two reflective light valves | Electricity | 27 | Expired |
| US6193393A | Apparatus and method for intensifying illumination brightness by time-superposing multiple pulsed light sources | Physics | 18 | Expired |
| US5786873A | Efficient optical system for a high resolution projection display employing reflection light valves | Electricity | 17 | Expired |
| US5729383A | Oblique viewing microscope system | Physics | 15 | Expired |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.