Remote plasma generation process using a two-stage showerhead
US4904621A · kind A · utility
245Cited by
29References
6Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Jul 16, 1987 |
| Grant date | Feb 27, 1990 |
| Priority date | — |
| Expiry date | Jul 16, 2007 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01L21/31138
- WIPO fieldSemiconductors
- WIPO sectorElectrical engineering
Abstract
A processing apparatus and method for performing a descum process (i.e. a process for removal of polymers and other organic residues) which uses a remote plasma, supplied through a distributor which includes a two-stage showerhead, to achieve improved results.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.