Anti-reflective coating
US4910122A · kind A · utility
Assignee
Inventors
Key dates
| Filing date | Aug 6, 1984 |
| Grant date | Mar 20, 1990 |
| Priority date | — |
| Expiry date | Aug 6, 2004 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10S438/952
- WIPO fieldSemiconductors
- WIPO sectorElectrical engineering
Abstract
A light absorbing medium to be interposed under photosensitive layers, such as a photo-resist for integrated circuit "chips" to eliminate defects caused by reflected light, has a polymer vehicle which can penetrate into small depressions of a substrate and form a thin, smooth and uniform coating. The coating includes a light absorbing dye. This light absorbing layer is imageable in the process. The light absorbing material eliminates many of the defects caused by reflected light resulting in increased sharpness of the images in the photo-resist. The material reduces the losses due to defects and increases the yield of useable product.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.