Brewer Science, Inc.
188Patents
110Active
188Granted
54Portfolio score
Filing activity: Aug 6, 1984 → Feb 15, 2023 · 43 expiring within 5 years
Most-cited patents
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US8968989B2 | Assist layers for EUV lithography | Emerging Cross-Sectional Technologies | 278 | Active |
| US4910122A | Anti-reflective coating | Emerging Cross-Sectional Technologies | 223 | Expired |
| US5693691A | Thermosetting anti-reflective coatings compositions | Emerging Cross-Sectional Technologies | 93 | Expired |
| US5919599A | Thermosetting anti-reflective coatings at deep ultraviolet | Chemistry; Metallurgy | 79 | Expired |
| US4822718A | Light absorbing coating | Electricity | 75 | Expired |
| US5340619A | Method of manufacturing a color filter array | Emerging Cross-Sectional Technologies | 73 | Expired |
| US5336925A | Positive working polyamic acid/imide photoresist compositions and their use as dielectrics | Electricity | 59 | Expired |
| US6716767B2 | Contact planarization materials that generate no volatile byproducts or residue during curing | Electricity | 56 | Expired |
| US5281690A | Base-soluble polyimide release layers for use in microlithographic processing | Chemistry; Metallurgy | 54 | Expired |
| US4732858A | Adhesion promoting product and process for treating an integrated circuit substrate | Physics | 50 | Expired |
| US5674648A | Anti-reflective coating | Physics | 46 | Expired |
| US4876165A | Light filters for microelectronics | Electricity | 44 | Expired |
| US6852473B2 | Anti-reflective coating conformality control | Electricity | 42 | Expired |
| US6156479A | Thermosetting anti-refective coatings | Physics | 40 | Expired |
| US7026237B2 | Fill material for dual damascene processes | Emerging Cross-Sectional Technologies | 36 | Expired |
| US5234990A | Polymers with intrinsic light-absorbing properties for anti-reflective coating applications in deep ultraviolet microlithography | Chemistry; Metallurgy | 36 | Expired |
| US4950583A | Adhesion promoting product and process for treating an integrated circuit substrate therewith | Emerging Cross-Sectional Technologies | 36 | Expired |
| US6303270A | Highly plasma etch-resistant photoresist composition containing a photosensitive polymeric titania precursor | Physics | 35 | Expired |
| US5935760A | Thermosetting polyester anti-reflective coatings for multilayer photoresist processes | Emerging Cross-Sectional Technologies | 35 | Expired |
| US5362608A | Microlithographic substrate cleaning and compositions therefor | Physics | 32 | Expired |
| US8257910B1 | Underlayers for EUV lithography | Physics | 29 | Active |
| US5780201A | Ultra thin photolithographically imageable organic black matrix coating material | Physics | 28 | Expired |
| US6391472B1 | Fill material for dual damascene processes | Emerging Cross-Sectional Technologies | 27 | Expired |
| US8236669B2 | High-temperature spin-on temporary bonding compositions | Emerging Cross-Sectional Technologies | 25 | Active |
| US5401613A | Method of manufacturing microelectronic devices having multifunctional photolithographic layers | Physics | 22 | Expired |
Source: USPTO / EPO open patent data. Counts and citation impact are objective bibliographic measures.