Gas flow control apparatus
US4913192A · kind A · utility
Assignee
Inventor
Key dates
| Filing date | Apr 3, 1989 |
| Grant date | Apr 3, 1990 |
| Priority date | — |
| Expiry date | Apr 3, 2009 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10T137/87643
- WIPO fieldChemical engineering
- WIPO sectorChemistry
Abstract
Gas flow control apparatus for controlling the flow of a process gas through a conduit system to a process site, for halting the flow of gas when the process is completed, and for then developing a partial vacuum in the conduit system sufficiently high to reduce the concentration of process gas and maintain it in a gaseous state. The partial vacuum is developed by carrier gas flowing through a venturi in communication with the conduit system supplying the process gas. The carrier gas also expels any remnants of the process gas from all points between the venturi and the process site. Further, the system can be used for vaporizing gases from liquids for use in an atmospheric process at the process site, the carrier gas flowing through the venturi and vaporizing a liquid in a chamber upstream of the venturi. The vaporized gases can then be regulated by a mass flow controller.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.