Apparatus and method for registration of shadow masked thin-film patterns
US4915057A · kind A · utility
Assignee
Inventors
Key dates
| Filing date | Nov 14, 1986 |
| Grant date | Apr 10, 1990 |
| Priority date | — |
| Expiry date | Nov 14, 2006 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01L21/682
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
An apparatus and method for registration or alignment of thin film structure patterns on a substrate formed with the use of an apertured mask in a vacuum deposition system. On particular the alignment apparatus is comprised of a mask holder assembly, which supports the apertured mask, and a substrate carrier which engages with the holder assembly. Upon placing the engaged alignment apparatus in a a deposition chamber, a magnet is positioned adjacent the holder assembly in order to formly hold the apertured mask against a substrate prior to vacuum to deposition. Upon depositing the pattern material, the magnet and holder assembly are disengaged, resulting in a pattern of thin film structures remaining on the substrate. The present invention is effective for remotely operating automatic masking systems where there is a need to eliminate the need for breaking vacuum in a deposition system.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.