Abrasive composition and process for polishing
US4915710A · kind A · utility
25Cited by
9References
17Claims
0Family size
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Inventors
Key dates
| Filing date | Mar 16, 1989 |
| Grant date | Apr 10, 1990 |
| Priority date | — |
| Expiry date | Mar 16, 2009 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC09K3/1463
- WIPO fieldBasic materials chemistry
- WIPO sectorChemistry
Abstract
An abrasive composition particularly suitable for polishing an aluminum-based substrate for a magnetic recording disc, the composition comprising: an alumineous abrasive, preferably in an amount of 3 to 25% by weight; a polishing accelerator of gluconic and/or lactic acid, preferably in an amount of 0.1 to 3% by weight; optionally with sodium gluconate and/or sodium lactate in an amount of 0.1 to 3% by weight; colloidal alumina, preferably in an amount of 0.1 to 5% by weight; and water, the composition typically having a pH of 3 to 5.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.