High sensitivity resists having autodecomposition temperatures greater than about 160.degree. C.
US4931379A · kind A · utility
Assignee
Inventors
Key dates
| Filing date | Nov 3, 1988 |
| Grant date | Jun 5, 1990 |
| Priority date | — |
| Expiry date | Nov 3, 2008 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/039
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
The present invention relates to increasing the autodecomposition temperature of particular resists. The resists are comprised of structures having recurrent acid labile groups which are typically pendant to the polymeric backbone. The autodecomposition temperature of a resist is increased by selecting substituent sidechains on the acid labile group which exhibit increased stability. Sidechain structures which provide increased autodecomposition stability include secondary structures capable of forming secondary carbonium ion intermediates and having an available proton adjacent to the carbonium ion formed during cleavage. Moieties which can be used as the secondary sidechain structures include secondary alkyl, including both cyclic and alicyclic alkyl, substituted deactivated secondary benzyl, and 1-(deactivated heterocyclic) secondary alkyl.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.