Optical waveguide and method for its manufacture
US4934774A · kind A · utility
11Cited by
2References
3Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Jun 8, 1989 |
| Grant date | Jun 19, 1990 |
| Priority date | — |
| Expiry date | Jun 8, 2009 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG02B6/1347
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
An optical waveguide is made by forming a layer of SiO.sub.2 on a substrate and implanting a region of the SiO.sub.2 layer with Si ions to define a region containing a stoichiometric excess of Si which defines a region having an elevated refractive index surrounded by a region having a lower refractive index. The resulting optical waveguide is stable at the high temperatures required for many semiconductor processing methods, and is useful for optical interconnection in integrated optical and optoelectronic devices.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.