Alignment and exposure apparatus and method for manufacture of integrated circuits
US4937618A · kind A · utility
Assignee
Inventors
Key dates
| Filing date | Jun 20, 1989 |
| Grant date | Jun 26, 1990 |
| Priority date | — |
| Expiry date | Jun 20, 2009 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F9/7057
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
An alignment apparatus including a first off-axis alignment optical system having a magnification, and a second off-axis alignment optical system having a magnification higher than that of the first off-axis alignment optical system, wherein the apparatus is operable in a global alignment mode using the second off-axis alignment optical system. In another aspect, there is provided an alignment apparatus which includes a first off-axis alignment optical system having a magnification, a second off-axis alignment optical system having a magnification higher than that of the first off-axis alignment optical system, and a TTL alignment optical system, wherein the alignment apparatus is operable in a global alignment mode using the second off-axis alignment optical system and is operable in another global alignment mode using the TTL optical alignment system.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.