Bunei Hamasaki
10Patents
8h-index
15Co-inventors
65Inventor score
Filing activity: Jun 27, 1985 → Jul 14, 1999
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US4677474A | Wafer prober | Electricity | 54 | Expired |
| US4937618A | Alignment and exposure apparatus and method for manufacture of integrated circuits | Physics | 39 | Expired |
| US4918320A | Alignment method usable in a step-and-repeat type exposure apparatus for either global or dye-by-dye alignment | Physics | 25 | Expired |
| US5050111A | Alignment and exposure apparatus and method for manufacture of integrated circuits | Physics | 24 | Expired |
| US5365342A | Alignment and exposure apparatus and method for manufacture of integrated circuits | Electricity | 21 | Expired |
| US6499007B1 | Parameter editing method and semiconductor exposure system | Physics | 17 | Expired |
| US4801808A | Alignment and exposure apparatus having an objective lens system capable of observing a mark on an exposure optical holding member to permit alignment of a mask relative to the exposure optical system | Physics | 13 | Expired |
| US4811059A | Alignment method | Physics | 11 | Expired |
| US4881100A | Alignment method | Physics | 4 | Expired |
| US5197118A | Control system for a fine pattern printing apparatus | Physics | 3 | Expired |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.