Exposure system with exposure controlling acoustooptic element
US4947047A · kind A · utility
40Cited by
5References
19Claims
0Family size
Assignee
Inventor
Key dates
| Filing date | Feb 2, 1988 |
| Grant date | Aug 7, 1990 |
| Priority date | — |
| Expiry date | Feb 2, 2008 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG02F1/113
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
An exposure system is disclosed which uses a pulsed laser, such as an excimer, as the light source for exposure. For exposure control, an acoustooptic element is used. More specifically, the acoustooptic element is used to modulate the intensity of a pulsed laser beam emitted from the excimer laser, to thereby allow precise control of the exposure with respect to a wafer having a resist coating.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.