Method and apparatus for producing magnetically-coupled planar plasma
US4948458A · kind A · utility
499Cited by
6References
24Claims
0Family size
Assignee
Inventor
Key dates
| Filing date | Aug 14, 1989 |
| Grant date | Aug 14, 1990 |
| Priority date | — |
| Expiry date | Aug 14, 2009 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH05H1/46
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
An apparatus for producing a planar plasma in a low pressure process gas includes a chamber and an external planar coil. Radiofrequency resonant current is induced in the planar coil which in turn produces a planar magnetic field within the exclosure. The magnetic field causes circulating flux of electrons which in turn produces a planar region of ionic and radical species. The system may be used for plasma treatment of a variety of planar articles, typically semiconductor wafers which are oriented parallel to the plasma within the enclosure.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.