Deposition of diamond films
US4948629A · kind A · utility
26Cited by
5References
8Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Feb 10, 1989 |
| Grant date | Aug 14, 1990 |
| Priority date | — |
| Expiry date | Feb 10, 2009 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC30B29/04
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
Diamond films are deposited at substrates below temperatures of 400.degree. C. by chemical vapor deposition using a high powered pulsed laser and a vapor which is an aliphatic carboxylic acid or an aromatic carboxylic anhydride.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.