Nigel Hacker
40Patents
14h-index
28Co-inventors
81Inventor score
Filing activity: Feb 17, 1987 → Apr 5, 2007
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US6268457A | Spin-on glass anti-reflective coatings for photolithography | Emerging Cross-Sectional Technologies | 115 | Expired |
| US6365765B1 | Spin-on-glass anti-reflective coatings for photolithography | Emerging Cross-Sectional Technologies | 79 | Expired |
| US6506497B1 | Spin-on-glass anti-reflective coatings for photolithography | Emerging Cross-Sectional Technologies | 59 | Expired |
| US6444495B1 | Dielectric films for narrow gap-fill applications | Electricity | 56 | Expired |
| US6472076B1 | Deposition of organosilsesquioxane films | Emerging Cross-Sectional Technologies | 36 | Expired |
| US4948629A | Deposition of diamond films | Chemistry; Metallurgy | 26 | Expired |
| US6143855A | Organohydridosiloxane resins with high organic content | Electricity | 25 | Expired |
| US6653718B2 | Dielectric films for narrow gap-fill applications | Electricity | 22 | Expired |
| US6824879B2 | Spin-on-glass anti-reflective coatings for photolithography | Emerging Cross-Sectional Technologies | 21 | Expired |
| US6969753B2 | Spin-on-glass anti-reflective coatings for photolithography | Emerging Cross-Sectional Technologies | 21 | Expired |
| US6043330A | Synthesis of siloxane resins | Electricity | 20 | Expired |
| US6956097B2 | Spin-on-glass anti-reflective coatings for photolithography | Emerging Cross-Sectional Technologies | 18 | Expired |
| US6177199A | Dielectric films from organohydridosiloxane resins with low organic content | Emerging Cross-Sectional Technologies | 18 | Expired |
| US7029826B2 | Method to restore hydrophobicity in dielectric films and materials | Emerging Cross-Sectional Technologies | 16 | Expired |
| US7012125B2 | Spin-on-glass anti-reflective coatings for photolithography | Emerging Cross-Sectional Technologies | 14 | Expired |
| US6512071B1 | Organohydridosiloxane resins with high organic content | Electricity | 14 | Expired |
| US4760013A | Sulfonium salt photoinitiators | Emerging Cross-Sectional Technologies | 14 | Expired |
| US6218020A | Dielectric films from organohydridosiloxane resins with high organic content | Emerging Cross-Sectional Technologies | 12 | Expired |
| US5973095A | Synthesis of hydrogensilsesquioxane and organohydridosiloxane resins | Chemistry; Metallurgy | 11 | Expired |
| US6020410A | Stable solution of a silsesquioxane or siloxane resin and a silicone solvent | Chemistry; Metallurgy | 11 | Expired |
| US6218497A | Organohydridosiloxane resins with low organic content | Chemistry; Metallurgy | 10 | Expired |
| US6358559B1 | Dielectric films from organohydridosiloxane resins with low organic content | Emerging Cross-Sectional Technologies | 10 | Expired |
| US6967172B2 | Colloidal silica composite films for premetal dielectric applications | Electricity | 10 | Expired |
| US7678462B2 | Spin-on-glass anti-reflective coatings for photolithography | Emerging Cross-Sectional Technologies | 9 | Active |
| US6440550B1 | Deposition of fluorosilsesquioxane films | Emerging Cross-Sectional Technologies | 9 | Expired |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.