Microlithographic apparatus
US4952858A · kind A · utility
112Cited by
17References
17Claims
0Family size
Inventor
Key dates
| Filing date | May 18, 1988 |
| Grant date | Aug 28, 1990 |
| Priority date | — |
| Expiry date | May 18, 2008 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01L21/682
- WIPO fieldSemiconductors
- WIPO sectorElectrical engineering
Abstract
This invention is directed to electro-magnetic alignment apparatus which includes a monolithic stage, a sub-stage, an isolated reference structure, force actuators interposed between the monolithic stage and the sub-stage for suspending and positioning the monolithic stage in space, sensors for sensing the position of the monolithic stage and outputting a signal to control circuitry, which compares the sensed position with a commanded stage position and outputs an error signal to the force actuator, and actuators for controlling the position of the sub-stage to follow the approximate position of the monolithic stage.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.