Patent · US Expired

Semiconductor wafer treating apparatus

US4955775A · kind A · utility

21Cited by
8References
5Claims
0Family size

Assignee

Inventors

Key dates

Filing dateDec 9, 1988
Grant dateSep 11, 1990
Priority date
Expiry dateDec 9, 2008

Classification

  • Technology area (CPC Y)Emerging Cross-Sectional Technologies
  • CPC primaryY10S414/14
  • WIPO fieldSurface technology, coating
  • WIPO sectorChemistry

Abstract

An apparatus is disclosed which can automatically load semiconductor wafers into a vertical type heat treatment furnace and unload treated semiconductor wafers out of the heat treatment furnace. The semiconductor wafer treating apparatus comprises exchange unit for exchanging the semiconductor wafers between the cassette and the wafer boat in a predetermined exchange position, transfer unit for allowing the wafer-held boat to be transported between the exchange position and a respective, vertical type heat treatment furnace and for allowing the transfer of the wafer boat to be effected between the transfer unit and the respective heat treatment furnace, and an elevator unit provided in the heat treatment furnace and adapted to receive the wafer boat from the transfer unit and to load the wafer boat into a vertically erect process tube and unload the wafer boat from the process tube.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.