Pattern test apparatus
US4962541A · kind A · utility
Assignees
Inventors
Key dates
| Filing date | Feb 10, 1988 |
| Grant date | Oct 9, 1990 |
| Priority date | — |
| Expiry date | Feb 10, 2008 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG06T2207/30148
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
Disclosed is a pattern test apparatus for detecting a fault on the basis of comparison/collation between a test reference pattern and a test target pattern, the apparatus being arranged such that a picture element area is defined by a circle with a predetermined radius on a reference matter having at test reference pattern, and when the number of the picture elements located on the reference pattern is larger than the number of the picture elements located outside the reference pattern, a part of the reference pattern corresponding to a picture element located in the center of the circle is deleted. By such an arrangement, the test reference pattern can be made analogous to the real test target pattern regardless of the shape thereof, so that misjudgment of a normal test target pattern for a fault pattern can be prevented.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.