Carbonylmethylene-heterocyclic compounds containing trihalogenomethyl groups, process for their preparation, and light-sensitive mixture containing the compounds

US4966828A · kind A · utility

Assignee

• Hoechst GmbH · DE

Inventors

• Reinhard Doenges · Bad Soden, DE
• Hans Ruckert
• Ulrich Geissler · Hochheim, DE
• Hartmut Steppan · Wiesbaden, DE

Key dates

• Filing date: Sep 13, 1984
• Grant date: Oct 30, 1990
• Expiry date: Sep 13, 2004

Classification

• Technology area (CPC Y): Emerging Cross-Sectional Technologies
• CPC primary: Y10S430/123
• WIPO field: Organic fine chemistry
• WIPO sector: Chemistry

Abstract

Disclosed is a compound of the general formula ##STR1## wherein L=H or CO--(R.sup.1).sub.n (CX.sub.3).sub.m, M=alkylene, alkenylene, Q=S, Se, O, dialkylmethylene, alken-1,2-ylene, 1,2-phenylene or N-R, with M+Q together forming 3 or 4 ring members, R=alkyl, aralkyl or alkoxyalkyl, R.sup.1 is an aromatic group and X=Cl, Br or I, with n=O and m=1 or n=1 and m=1 or 2. The compounds, on exposure, eliminate HX and form free radicals and are therefore highly effective as acid donors and free radical initiators for photochemical processes.