Phenolic-free stripping composition and use thereof
US4971715A · kind A · utility
16Cited by
17References
18Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Nov 18, 1988 |
| Grant date | Nov 20, 1990 |
| Priority date | — |
| Expiry date | Nov 18, 2008 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/426
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A stripping composition containing O-dichlorobenzene, dodecylbenzene sulfonic acid, perchloroethylene, and optionally an aromatic hydrocarbon containing at least 8 carbon atoms, and use thereof for removing photoresist.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.