Plasma removal of unwanted material
US4975146A · kind A · utility
8Cited by
9References
8Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Sep 8, 1989 |
| Grant date | Dec 4, 1990 |
| Priority date | — |
| Expiry date | Sep 8, 2009 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC23F4/00
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
A method fpr removing coatings from surfaces without damaging the underlying surface includes placing a surface having material to be removed thereon into a plasma reactor and exposing it to a gaseous plasma comprising a reactive halogen species. The reactive halogen species may be derived from one or more of many well known halogen gases. An optional step of cleaning the coating prior to exposure to the halogen plasma is recommended.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.