Heating system for substrates
US4975561A · kind A · utility
Assignee
Inventors
Key dates
| Filing date | Mar 3, 1989 |
| Grant date | Dec 4, 1990 |
| Priority date | — |
| Expiry date | Mar 3, 2009 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC23C16/481
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
A heating system for use in chemical vapor deposition equipment of the type wherein a reactant gas is directed in horizontal flow for depositing materials on a substrate which is supported in a reaction chamber on a susceptor which is rotatably driven for rotating the substrate about an axis which extends normally from its center. The heating system works in conjunction with a special heat sensing arrangement and includes an upper heating element assembly, a lower heating element assembly and a heat concentrator mechanism whic interact to provide rapid temperature build-up at the beginning of a processing cycle, rapid temperature attenuation at the end of a processing cycle and a controlled flat temperature profile during the processing cycle.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.