Particle beam shielding
US4976843A · kind A · utility
Assignee
Inventors
Key dates
| Filing date | Feb 2, 1990 |
| Grant date | Dec 11, 1990 |
| Priority date | — |
| Expiry date | Feb 2, 2010 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J2237/31749
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
An apparatus is described for allowing an ion beam and an electron beam to travel toward a predetermined region of a substrate surface during the sputter etching and imaging of insulating and other targets while preventing deflection of the electron beam by sources of stray electrostatic fields on the substrate surface. A metal shield is provided having a funnel-shaped portion leading to an orifice. The incident finely focused ion beam, together with the electron beam, which is used to neutralize the charge created by the incident ion beam, pass to the target through the orifice. The shield also physically supports a gas injection needle that injects a gas through the orifice toward the predetermined region.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.