Monolithic silicon membrane device fabrication process
US4978421A · kind A · utility
36Cited by
11References
7Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Nov 13, 1989 |
| Grant date | Dec 18, 1990 |
| Priority date | — |
| Expiry date | Nov 13, 2009 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10S438/977
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
The method of fabrication of a monolithic silicon membrane structure in which the membrane and its supporting framework are constructed from a single ultra thick body of silicon. The fabrication sequence includes the steps of providing a doped membrane layer on the silicon body, forming an apertured mask on the silicon body, and removal of an unwanted silicon region by mechanical grinding and chemical etching to provide a well opening in the silicon body terminating in the doped membrane.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.