Patent · US Expired

Negative photoresists of the polyimide type containing 1,2-disulfones

US4980268A · kind A · utility

12Cited by

3References

3Claims

0Family size

Assignee

Ciba-Geigy · US

Inventors

Ekkehard Bartmann · Langen (Hessen), DE
Rudolf Klug · Aschaffenburg, DE
Reinhard Schulz · Hannover, DE
Hartmut Hartner · Weiterstadt, DE

Key dates

Filing date	Mar 9, 1989
Grant date	Dec 25, 1990
Priority date	—
Expiry date	Mar 9, 2009

Classification

Technology area (CPC Y)Emerging Cross-Sectional Technologies
CPC primaryY10S430/128
WIPO fieldOptics
WIPO sectorInstruments

Abstract

The invention relates to negative photoresists of the polyimide type essentially containing, in an organic solvent, in each case at least PA0 (a) one polyamide-acid or polyamide-acid derivative prepolymer which can be converted into a highly heat-resistant polyimide polymer, PA0 (b) a photoinitiator, and, if appropriate, further customary additives which contain, as the photoinitiator, a compound of the formula I EQU R.sup.1 --SO.sub.2 --SO.sub.2 --R.sup.2 I PA0 in which R.sup.1 and R.sup.2 are as defined.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.