Ekkehard Bartmann
52Patents
14h-index
45Co-inventors
80Inventor score
Filing activity: Feb 10, 1989 → Dec 18, 2006
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US5122295A | Matrix liquid crystal display | Chemistry; Metallurgy | 58 | Expired |
| US5384065A | Matrix liquid-crystal display | Chemistry; Metallurgy | 37 | Expired |
| US5045229A | Difluoromethylene compounds | Chemistry; Metallurgy | 31 | Expired |
| US5487845A | Fluorobenzene derivatives and liquid-crystalline medium | Chemistry; Metallurgy | 29 | Expired |
| US5626793A | Liquid-crystalline compounds | Chemistry; Metallurgy | 23 | Expired |
| US5403512A | Vinyl compounds, and a liquid-crystalline medium | Chemistry; Metallurgy | 22 | Expired |
| US5389289A | Liquid-crystalline medium | Chemistry; Metallurgy | 22 | Expired |
| US5730904A | Partially fluroinated benzene derivatives, and liquid-crystalline medium | Chemistry; Metallurgy | 22 | Expired |
| US5589102A | Benzene derivatives, and liquid-crystalline medium | Chemistry; Metallurgy | 19 | Expired |
| US5562858A | Hexafluoropropyl ethers, and liquid-crystalline medium | Chemistry; Metallurgy | 18 | Expired |
| US5641429A | Fluorobenzene derivatives and liquid-crystalline medium | Chemistry; Metallurgy | 16 | Expired |
| US5536442A | Fluorinated liquid crystal compounds and liquid crystal medium containing same | Chemistry; Metallurgy | 16 | Expired |
| US5230829A | Phenylcyclohexanes, and a liquid-crystalline medium | Chemistry; Metallurgy | 14 | Expired |
| US5723682A | Difluorovinyl ethers | Chemistry; Metallurgy | 14 | Expired |
| US5106718A | Positive photoresist composition containing alkali-soluble phenolic resin, photosensitive quinonediazide compound and sulfonyl containing compound | Physics | 14 | Expired |
| US4980268A | Negative photoresists of the polyimide type containing 1,2-disulfones | Emerging Cross-Sectional Technologies | 12 | Expired |
| US6350904B1 | Method for producing ortho-alkylated benzoic acid derivatives | Emerging Cross-Sectional Technologies | 12 | Expired |
| US5643495A | 1,2,2,2-tetrafluoroethyl ethers, and liquid-crystalline medium | Chemistry; Metallurgy | 12 | Expired |
| US6004479A | Matrix liquid crystal display | Chemistry; Metallurgy | 12 | Expired |
| US5104768A | Positive photoresist composition containing radiation sensitive quinonediazide compound and completely esterified polyamic acid polymer | Emerging Cross-Sectional Technologies | 11 | Expired |
| US5378395A | Matrix liquid crystal display | Chemistry; Metallurgy | 11 | Expired |
| US5422035A | Benzene derivatives, and liquid-crystalline medium | Chemistry; Metallurgy | 11 | Expired |
| US5679285A | Vinylene compounds and liquid-crystalline medium | Chemistry; Metallurgy | 10 | Expired |
| US5744060A | Liquid-crystalline medium | Chemistry; Metallurgy | 10 | Expired |
| US6159393A | Benzene derivatives and liquid-crystalline medium | Chemistry; Metallurgy | 10 | Expired |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.