Removal of particles from solid-state surfaces by laser bombardment
US4980536A · kind A · utility
33Cited by
1References
5Claims
0Family size
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Key dates
| Filing date | Jan 8, 1990 |
| Grant date | Dec 25, 1990 |
| Priority date | — |
| Expiry date | Jan 8, 2010 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F1/20
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
To remove small particles from surfaces of solid bodies at least one laser pulse of high power density (excimer laser) is directed onto the surface. The method is particularly suited to clean Si-masks used in electron-beam lithographic devices. An arrangement for in-situ-cleaning of masks in accordance to this method is integrated in such an electron-beam lithographic device.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.